6kW MPCVD machine is particularly suitable for single crystal and polycrystalline diamond film CVD process, polycrystalline diamond (Polycrystalline Diamond) film chemical vapor deposition (CVD) ), surface treatment and modification of materials, high-quality diamond growth and low-temperature oxide growth and other applications.

 

♣Component
MPCVD machine includes control unit (PLC + touch screen, etc.), microwave unit (2450MHZ 6KW solid-state microwave generator, microwave transmission system, etc.), water cooling unit, vacuum unit (vacuum pump, vacuum measuring instrument) ,and others.

♣Working Processing
The mpcvd machine controls the flow of each gas path and the cavity pressure, and introduces the reactant gas source (CH4, H2, Ar, O2, N2, etc.) into the cavity and controls it under a certain pressure.After the airflow is stabilized, microwaves are generated by the 6kw solid state  microwave generator, and then the microwaves are introduced into the cavity by the waveguide.

Under the action of the microwave field, the reaction gas becomes a plasma state, forming a plasma ball suspended above the diamond substrate, and the high temperature of the plasma is used to heat the substrate to a certain temperature.The excess heat generated in the cavity is conducted away by the water cooling unit.

In the single crystal diamond (MPCVD) growth process, we ensure the optimal growth conditions by adjusting the power size, gas source composition and cavity pressure and other conditions. In addition, because the plasma ball has no contact with the cavity wall, this ensures that no impurities are mixed in the diamond during the growth process and improves the quality of the diamond.

Parameters of the MPCVD is as below:

Type	HMPS-2060SP
Total power supply	380VAC±5%/50Hz, three-phase four-wire, separate ground wire, 12kW
Equipment dimensions	1.95 (L) x 0.9 (W) x 1.85 (H) m
Item	Data
Microwave frequency	2450MHz
Solid-state microwave output power	0.1~6kw continuously adjustable
Microwave power stability	better than ±1% (at rated power level)
Micro-waviness	better than 1%
Control method	PLC control, 12-inch touch screen operation
Output waveguide interface	BJ-26, 22 with FD-26, 22 standard flange
Microwave vacuum discharge chamber	Φ200 x 300(H)TM mode
The plasma discharge area	More than Φ50mm in diameter; Stable discharge without shifting
Substrate temperature measurement	Infrared temperature measurement range 300~1400℃ (monochrome)
Substrate table device	Diameter of substrate table Φ60 mm; Water cooling
Effective adjustment amount of base station and cavity plate servo motor: 0~20 mm	0~20 mm
Working temperature	600~1200℃ (infrared temperature measurement); Control accuracy ±5℃
Working pressure	10torr~200torr, control accuracy 0.1torr
Continuous stable working time under normal conditions	>48h

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